The Laser Processing System for Semiconductors has an excimer laser (wavelength selectable) as the light source, and irradiates a rectangular top-flat beam onto the target using a scanning or step-and-repeat operation. It can be used for basic tests across a wide range of semiconductor processes (crystallization, activation, alloying, LLO, etc.).
| Laser | Wavelength | Selectable from 248 nm, 308 nm, 351 nm |
|---|---|---|
| Frequency | 20 Hz to 100 Hz | |
| Pulse width | 20 ns (Typical value) | |
| Optical system | Beam size | Square, Rectangle |
| Maximum energy density | Please contact us. | |
| Footprint [mm] | W 1,500 x L 2,000 x H 2,200 | |
